Results
1 -
3 of
3
(Click
here to explore results)
- Deposition of HfO2 and ZrO2 films by liquid injection MOCVD using new monomeric alkoxide precursors. Yim Fun Loo, Ruairi O'Kane, Anthony C. Jones, Helen C. Aspinall, Richard J. Potter, Paul R. Chalker, Jamie F. Bickley, Stephen Taylor, Lesley M. Smith
, J. Mater. Chem.
, 2005
, 15
, 1896
- Deposition of ZrO2 and HfO2 thin films by liquid injection MOCVD and ALD using ansa-metallocene
zirconium and hafnium precursors. Kate Black, Helen C. Aspinall, Anthony C. Jones, Katarzyna Przybylak, John Bacsa, Paul R. Chalker, Stephen Taylor, Ce Zhou Zhao, Simon D. Elliott, Aleksandra Zydor, Peter N. Heys
, J. Mater. Chem.
, 2008
, 18
, 4561
- Atomic layer deposition of hafnium oxide from tert-butoxytris(ethylmethylamido)hafnium and ozone: rapid growth, high density and thermal stability. Minha Seo, Yo-Sep Min, Seong Keun Kim, Tae Joo Park, Jeong Hwan Kim, Kwang Duk Na, Cheol Seong Hwang
, J. Mater. Chem.
, 2008
, 18
, 4324