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- A molecular electron density theory study for [3+2] cycloaddition reactions of N-benzylcyclohexylnitrone with methyl-3-butenoate. Haydar A. Mohammad-Salim, Huda Ahmed Basheer, Hassan H. Abdallah, Abdellah Zeroual, Lazgin Abdi Jamil
, New J. Chem.
, 2021
, 45
, 262
- Arrhenius parameters for the OH-initiated degradation of methyl crotonate, methyl-3,3-dimethyl acrylate, (E)-ethyl tiglate and methyl-3-butenoate over the temperature range of 288–314 K. Juan P. Colomer, María B. Blanco, Alicia B. Peñéñory, Ian Barnes, Peter Wiesen, Mariano A. Teruel
, RSC Adv.
, 2016
, 6
, 53723
- Kinetics and branching fractions of the hydrogen abstraction reaction from methyl butenoates by H atoms. Xiaoyu Li, Xiaoqing You, Chung K. Law, Donald G. Truhlar
, Phys. Chem. Chem. Phys.
, 2017
, 19
, 16563
- Synthesis of 2-aryloxy butenoates by copper-catalysed allylic C–H carboxylation of allyl aryl ethers with carbon dioxide. Atsushi Ueno, Masanori Takimoto, Zhaomin Hou
, Org. Biomol. Chem.
, 2017
, 15
, 2370
- One-pot vinylogous aldol addition of β,γ-unsaturated esters under mild conditions. İsmail Akçok, Ali Çağır
, New J. Chem.
, 2015
, 39
, 5121
- Reaction kinetics of hydrogen addition reactions to methyl butenoate. Yage Gao, Xiaoyu Li, Xiaoqing You
, Phys. Chem. Chem. Phys.
, 2020
, 22
, 5286
- Polar additive triggered chain walking copolymerization of ethylene and fundamental polar monomers. Yuxing Zhang, Zhongbao Jian
, Polym. Chem.
, 2022
, 13
, 4966
- Fuel-specific influences on the composition of reaction intermediates in premixed flames of three C5H10O2 ester isomers. Bin Yang, Charles K. Westbrook, Terrill A. Cool, Nils Hansen, Katharina Kohse-Höinghaus
, Phys. Chem. Chem. Phys.
, 2011
, 13
, 6901
- Hybrid silica micro-particles with light-responsive surface properties and Janus-like character. A. Romano, M. Sangermano, E. Rossegger, I. Mühlbacher, T. Griesser, M. Giebler, G. Palmara, F. Frascella, I. Roppolo, S. Schlögl
, Polym. Chem.
, 2021
, 12
, 3925
- Novel hexameric tin carboxylate clusters as efficient negative-tone EUV photoresists: high resolution with well-defined patterns under low energy doses. Jia-Rong Wu, Ting-An Lin, Yan-Ru Wu, Po-Hsiung Chen, Tsi-Sheng Gau, Burn-Jeng Lin, Po-Wen Chiu, Rai-Shung Liu
, Nanoscale Adv.
, 2023
, 5
, 3033