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2Kenneth E. Gonsalves, Mingxing Wang, Cheng-Tsung Lee, Wang Yueh, Melina Tapia-Tapia, Nikola Batina and Clifford L. Henderson.
Novel chemically amplified resists incorporating anionic photoacid generator functional groups for sub-50-nm half-pitch lithography, J. Mater. Chem., 2009, 19, 2797.